| Record ID | ia:glowdischargepro0000chap |
| Source | Internet Archive |
| Download MARC XML | https://archive.org/download/glowdischargepro0000chap/glowdischargepro0000chap_marc.xml |
| Download MARC binary | https://www.archive.org/download/glowdischargepro0000chap/glowdischargepro0000chap_meta.mrc |
LEADER: 00935cam a2200277 i 4500
001 80017047
003 DLC
005 20030911192026.0
008 800514s1980 nyua b 001 0 eng
010 $a 80017047
020 $a047107828X :$c$26.95 (est.)
040 $aDLC$cDLC$dDLC
050 00 $aQC702.7.P6$bC48
082 00 $a537.5/2
100 1 $aChapman, Brian N.
245 10 $aGlow discharge processes :$bsputtering and plasma etching /$cBrian Chapman.
260 $aNew York :$bWiley,$c1980.
300 $axv, 406 p. :$bill. ;$c24 cm.
500 $a"A Wiley-Interscience publication."
504 $aBibliography: p. 397-400.
500 $aIncludes index.
650 0 $aSputtering (Physics)
650 0 $aGlow discharges.
650 0 $aPlasma etching.
856 42 $3Publisher description$uhttp://www.loc.gov/catdir/description/wiley034/80017047.html
856 4 $3Table of Contents$uhttp://www.loc.gov/catdir/toc/onix05/80017047.html