| Record ID | ia:emerginglithogra4343unse |
| Source | Internet Archive |
| Download MARC XML | https://archive.org/download/emerginglithogra4343unse/emerginglithogra4343unse_marc.xml |
| Download MARC binary | https://www.archive.org/download/emerginglithogra4343unse/emerginglithogra4343unse_meta.mrc |
LEADER: 01527cam a22003377a 4500
001 2001279005
003 DLC
005 20020517142009.0
008 011214s2001 waua b 101 0 eng d
010 $a 2001279005
035 $a(OCoLC)ocm48153041
040 $aLHL$cLHL$dDLC
042 $alccopycat
020 $a0819440299
050 00 $aTK7874$b.E525 2001
082 00 $a621.3815/31$221
245 00 $aEmerging lithographic technologies V :$b27 February-1 March, 2001, Santa Clara, [California], USA /$cElizabeth A. Dobisz, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.
260 $aBellingham, Wash. :$bSPIE,$cc2001.
300 $axv, 818 p. :$bill. (some col.) ;$c28 cm.
490 1 $aProceedings of SPIE ;$vv. 4343
504 $aIncludes bibliographical references and index.
650 0 $aLithography, Electron beam$vCongresses.
650 0 $aMicrolithography$xIndustrial applications$vCongresses.
650 0 $aX-ray lithography$vCongresses.
650 0 $aX-rays$xIndustrial applications$vCongresses.
650 0 $aMasks (Electronics)$vCongresses.
700 1 $aDobisz, Elizabeth Ann.
710 2 $aSociety of Photo-optical Instrumentation Engineers.
710 2 $aSemiconductor Equipment and Materials International
710 2 $aInternational SEMATECH.
830 0 $aProceedings of SPIE--the International Society for Optical Engineering ;$vv. 4343.