| Record ID | harvard_bibliographic_metadata/ab.bib.00.20150123.full.mrc:281742869:1267 |
| Source | harvard_bibliographic_metadata |
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LEADER: 01267pam a2200253 a 4500
001 000370048-8
005 20020606090541.3
008 821221s1983 nyua b 00100 eng
010 $a 82024947
020 $a0070626863 :$c$32.50 (est.)
035 0 $aocm09133580
040 $aDLC$cDLC
050 00 $aTK7874$b.V566 1983
245 00 $aVLSI technology /$cedited by S.M. Sze.
260 0 $aNew York :$bMcGraw-Hill,$cc1983.
300 $axiv, 654 p. :$bill. ;$c24 cm.
490 0 $aMcGraw-Hill series in electrical engineering. Electronics and electronic circuits
504 $aIncludes bibliographical references and index.
505 0 $aP.1. Crystal growth and water preparation -- P.2. Epitaxy -- P.3. Dielectric and polysilicon film deposition -- P.4. Oxidation -- P.5. Diffusion -- P.6. Ion implantation -- P.7. Lithography -- P.8. Dry etching -- P.9. Metallization -- P.10. Process simulation -- P.11. VLSI process integration -- P.12. Diagnostic techniques -- P.13. Assembly techniques and packaging -- P.14. Yield and reliability.
650 0 $aIntegrated circuits$xVery large scale integration.
700 1 $aSze, S. M.,$d1936-
776 08 $iOnline version:$tVLSI technology.$dNew York : McGraw-Hill, ©1983$w(OCoLC)558489641
988 $a20020608
906 $0DLC