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Silicon, Grinding and polishingShowing 1 featured edition. View all 1 editions?
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1
Chemical Mechanical Polishing in Silicon Processing, Volume 63 (Semiconductors and Semimetals)
October 15, 1999, Academic Press
Hardcover
in English
0127521720 9780127521725
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First Sentence
"Chemical mechanical planarization (CMP) has become, in a few short years, a required semiconductor processing module used in fabrication facilities worldwide."
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