Open Library logo
New Feature: You can now embed Open Library books on your website!   Learn More
Last edited by ImportBot
October 22, 2010 | History

Metrology, inspection, and process control for microlithography XXIV 1 edition

Metrology, inspection, and process control for microlithography XXIV
Christopher J. Raymond

No ebook available.


Prefer the physical book? Check nearby libraries with:


Buy this book


There's no description for this book yet. Can you add one?
There is only 1 edition record, so we'll show it here...  •  Add edition?

Metrology, inspection, and process control for microlithography XXIV
22-25 February 2010, San Jose, California, United States
Christopher J. Raymond, editor ; sponsored by SPIE ; cosponsored by Nova Measuring Instruments Ltd. (Israel) ; cooperating organization, SEMATECH Inc. (United States)

Published 2010 by SPIE, $c c2010. in Bellingham, Wash .
Written in English.

Edition Notes

Includes bibliographical references.

Series
Proceedings of SPIE -- v. 7638

Classifications

Dewey Decimal Class
621.3815/48
Library of Congress
TK7874 .M43768 2010

The Physical Object

Pagination
2 v. :

ID Numbers

Open Library
OL24390007M
ISBN 10
0819480525
ISBN 13
9780819480521
LC Control Number
2010459448
OCLC/WorldCat
663773608

History

Download catalog record: RDF / JSON
October 22, 2010 Created by ImportBot initial import