Advances in Low Temperature RF Plasmas. Basis for Process Design

by T. Makabe
Published in May 1, 2002, Elsevier Publishing Company

Advances in Low Temperature RF Plasmas. Basis for Process Design

T. Makabe

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Language:	English
Edition:	1st edition
Format:	Hardcover
Dimensions:	10.6 x 7.7 x 0.8 inches
Weight:	2.2 pounds
ISBN 10:	0444510958
ISBN 13:	9780444510952
Subject:	Low temperature physics Plasma physics Science Science/Mathematics Applied Sciences Physics Electromagnetism Solid State Physics Industrial applications Low temperature plasmas