{"isbn_13": ["9780444510952"], "physical_format": "Hardcover", "weight": "2.2 pounds", "languages": [{"key": "/l/eng"}], "publishers": ["Elsevier Publishing Company"], "number_of_pages": 328, "last_modified": {"type": "/type/datetime", "value": "2008-04-30 09:38:13.731961"}, "id": 13685677, "edition_name": "1st edition", "isbn_10": ["0444510958"], "publish_date": "May 1, 2002", "key": "/b/OL10260302M", "authors": [{"key": "/a/OL1436668A"}], "title": "Advances in Low Temperature RF Plasmas. Basis for Process Design", "type": {"key": "/type/edition"}, "subjects": ["Low temperature physics", "Plasma physics", "Science", "Science/Mathematics", "Applied Sciences", "Physics", "Electromagnetism", "Solid State Physics", "Industrial applications", "Low temperature plasmas"], "physical_dimensions": "10.6 x 7.7 x 0.8 inches", "revision": 1}